Syed Rizvi9780824753740, 0824753747
The Handbook of Photomask Manufacturing Technology features contributions from 40 internationally prominent authors from industry, academia, government, national labs, and consortia. These authors discuss conventional masks and their supporting technologies, as well as next-generation, non-optical technologies such as extreme ultraviolet, electron projection, ion projection, and x-ray lithography. The book begins with an overview of the history of photomask development. It then demonstrates the steps involved in designing, producing, testing, inspecting, and repairing photomasks, following the sequences observed in actual production. The text also includes sections on materials used as well as modeling and simulation.
Continued refinements in the photomask-making process have ushered in the sub-wavelength era in nanolithography. This invaluable handbook synthesizes these refinements and provides the tools and possibilities necessary to reach the next generation of microfabrication technologies. ——Features——————— · Provides a multi-dimensional view of photomask technology · Offers a general overview and detailed, in-depth discussions of photomask technology · Builds expertise on design and processing to optimize photomask constraints without sacrificing functionality and specs of the chip · Discusses mask writing, providing detailed treatment of electron beam writers and laser writers · Contains a complete walkthrough of the development process from conception to final testing, including modeling and simulation
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