CW Beam Processing of Silicon and Other Semiconductors

James F. Gibbons (Eds.)0127521178, 9780127521176

Table of contents :
Content:
Edited by
Page iii

Copyright page
Page iv

List of Contributors
Page ix

Preface
Pages xi-xii
James F. Gibbons

Chapter 1 Beam Processing of Silicon Original Research Article
Pages 1-70
James F. Gibbons

Chapter 2 Temperature Distributions and Solid Phase Reaction Rates Produced by Scanning CW Beams Original Research Article
Pages 71-105
Arto Lietoila, Richard B. Gold, James F. Gibbons, Lee A. Christel

Chapter 3 Applications of CW Beam Processing to Ion Implanted Crystalline Silicon Original Research Article
Pages 107-175
Arto Lietoila, James F. Gibbons

Chapter 4 Electronic Defects in CW Transient Thermal Processed Silicon Original Research Article
Pages 177-226
N.M. Johnson

Chapter 5 Beam Recrystallized Polycrystalline Silicon: Properties, Applications, and Techniques Original Research Article
Pages 227-339
K.F. Lee, T.J. Stultz, James F. Gibbons

Chapter 6 Metal-Silicon Reactions and Silicide Formation Original Research Article
Pages 341-395
T. Shibata, A. Wakit, T.W. Sigmon, James F. Gibbons

Chapter 7 CW Beam Processing of Gallium Arsenide Original Research Article
Pages 397-445
Yves I. Nissim, James F. Gibbons

Index
Pages 447-451